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Evaluation of litho printability of DRAM contact hole patterns with various programmed defects

著者名:
K. Seo ( Hynix Semiconductor Inc. (South Korea) )
S. Lee ( Hynix Semiconductor Inc. (South Korea) )
H. Kim ( Hynix Semiconductor Inc. (South Korea) )
D. Hwang ( Hynix Semiconductor Inc. (South Korea) )
S. Kim ( Hynix Semiconductor Inc. (South Korea) )
G. Jeong ( Hynix Semiconductor Inc. (South Korea) )
O. Han ( Hynix Semiconductor Inc. (South Korea) )
C. Chen ( KLA-Tencor Corp. (USA) )
D. Yee ( KLA-Tencor Corp. (USA) )
E. Kim ( KLA-Tencor Corp. (USA) )
K. Park ( KLA-Tencor Corp. (USA) )
N. Kim ( KLA-Tencor Corp. (USA) )
S. Choi ( KLA-Tencor Corp. (USA) )
D. Kim ( KLA-Tencor Corp. (USA) )
S. Lohokare ( KLA-Tencor Corp. (USA) )
さらに 10 件
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

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