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DFM based on layout restriction and process window verification for sub-60nm memory devices

著者名:
S. -H. Choi ( Samsung Electronics Co., Ltd. (South Korea) )
D. -H. Jung ( Samsung Electronics Co., Ltd. (South Korea) )
J. -S. Hong ( Samsung Electronics Co., Ltd. (South Korea) )
J. -H. Choi ( Samsung Electronics Co., Ltd. (South Korea) )
M. -H. Yoo ( Samsung Electronics Co., Ltd. (South Korea) )
J. -T. Kong ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 1 件
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

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