Blank Cover Image

High-performance reticle inspection tool for the 65-nm node and beyond

著者名:
T. -Y. Kang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. -H. Chen ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. -H. Ho ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
L. Hsu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Y. -C. Ku ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
K. Nakamura ( NEC Corp. (Japan) )
H. Moribe ( NEC Corp. (Japan) )
T. Bashomatsu ( NEC Corp. (Japan) )
K. Matsumura ( NEC Corp. (Japan) )
K. Hatta ( NEC Control Systems, Ltd. (Japan) )
H. Takahashi ( NEC Control Systems, Ltd. (Japan) )
A. Uehara ( NEC Control Systems, Ltd. (Japan) )
T. Igeta ( NEC Control Systems, Ltd. (Japan) )
H. Uno ( NEC Control Systems, Ltd. (Japan) )
R. Igarashi ( NEC Control Systems, Ltd. (Japan) )
H. Matsuda ( NEC Control Systems, Ltd (Japan) )
さらに 11 件
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

類似資料:

1 国際会議録 Improvement of image quality and inspection speed in LM7500 reticle

H. Moribe, T. Bashomatsu, K. Matsumura, A. Uehara, H. Takahashi

Society of Photo-optical Instrumentation Engineers
7 国際会議録 257-nm wavelength mask inspection for 65-nm node reticles

Yoshikawa, R., Tanizaki, H., Watanabe, T., Inoue, H., Ogawa, R., Endo, S., Ikeda, M., Takahashi, Y., Watanabe, H.

SPIE - The International Society of Optical Engineering
2 国際会議録 Resist pattern inspection function for LM7500 reticle inspection system

H. Moribe, Y. Kato, K. Nakamura, T. Bashomatsu, T. Igeta

Society of Photo-optical Instrumentation Engineers
8 国際会議録 Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Chung, D. -H., Ohira, K., Yoshioka, N., Matsumura, K., Tojo, T., Otaki, M.

SPIE - The International Society of Optical Engineering
3 国際会議録 Optical mask inspection strategy for 65-nm node and beyond

Chung, D.-H.P., Ohira, K., Yoshioka, N., Matsumura, K., Tojo, T., Otaki, M.

SPIE - The International Society of Optical Engineering
9 国際会議録 Reticle CD-SEM for 65-nm technology node and beyond

Schlueter, G. W. B., Nakamura, T., Matsumoto, J., Seyama, M., Whittey, J. M.

SPIE - The International Society of Optical Engineering
4 国際会議録 Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]

Kikuiri, N., Murakami, S., Tsuchiya, H., Tateno, M., Takahara, K., Imai, S., Hirano, R., Isomura, I., Tsuji, Y., Tamura, …

SPIE - The International Society of Optical Engineering
10 国際会議録 Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool

Lai, R., Hsu, L., Kung, C.H., Hung, J., Huang, W.H., Yoo, C.-S., Huang, Y.-T., Hsu, V.

SPIE - The International Society of Optical Engineering
5 国際会議録 Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process [5992-07]

Hsu, L. T. H., Ho, C. H., Lin, C. C., Hsu, V., Chen, E., Yu, P., Son, K.

SPIE - The International Society of Optical Engineering
11 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node

Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., …

SPIE-The International Society for Optical Engineering
6 国際会議録 Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Hsu, S., Chu, T. -B., Van Den Broeke, D., Chen, J. F., Hsu, M., Corcoran, N. P., Volk, W., Ruch, W. E., Sier, J. -P., …

SPIE - The International Society of Optical Engineering
12 国際会議録 EBDW technology for EB shuttle at 65nm node and beyond

T. Maruyama, M. Takakuwa, Y. Kojima, Y. Takahashi, K. Yamada

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12