Calibration of CD mask standards for the 65-nm node: CoG and MoSi
- 著者名:
J. Richter ( Advanced Mask Technology Ctr. (Germany) ) T. Heins ( Advanced Mask Technology Ctr. (Germany) ) R. Liebe ( Advanced Mask Technology Ctr. (Germany) ) B. Bodermann ( Physikalisch-Technische Bundesanstalt (Germany) ) A. Diener ( Physikalisch-Technische Bundesanstalt (Germany) ) D. Bergmann ( Physikalisch-Technische Bundesanstalt (Germany) ) C. G. Frase ( Physikalisch-Technische Bundesanstalt (Germany) ) H. Bosse ( Physikalisch-Technische Bundesanstalt (Germany) ) - 掲載資料名:
- EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6533
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466556 [0819466557]
- 言語:
- 英語
- 請求記号:
- P63600/6533
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Comparative scatterometric CD measurements on a MoSi photo mask using different metrology tools
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |