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Patterning effect and correlated electrical model of post-OPC MOSFET devices

著者名:
Y. C. Cheng ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
T. H. Ou ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
M. H. Wu ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
W. L. Wang ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
J. H. Feng ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
W. C. Huang ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
C. M. Lai ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
R. G. Liu ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
Y. C. Ku ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
さらに 4 件
掲載資料名:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6521
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
言語:
英語
請求記号:
P63600/6521
資料種別:
国際会議録

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