Blank Cover Image

Effects of laser bandwidth on iso-dense bias and line end shortening at sub-micron process nodes

著者名:
R. C. Peng ( TSMC Corp. (Taiwan) )
A. K. Yang ( TSMC Corp. (Taiwan) )
L. J. Chen ( TSMC Corp. (Taiwan) )
Y. W. Guo ( TSMC Corp. (Taiwan) )
H. H. Liu ( TSMC Corp. (Taiwan) )
J. Lin ( TSMC Corp. (Taiwan) )
A. Chang ( Cymer, Inc. (Taiwan) )
さらに 2 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

類似資料:

1 国際会議録 Reducing or eliminating line-end shortening and iso/dense bias by tuning NA and sigma

Toublan,O., Schiavone,P.

SPIE-The International Society for Optical Engineering
7 国際会議録 Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]

Chang, Y. Y., Wu, Y.-H., Shih, C.-L., Lin, J., Kan, F.

SPIE - The International Society of Optical Engineering
2 国際会議録 Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

K. Yoshimochi, T. Uchiyama, T. Tamura, T. Theeuwes, R. Peeters, H. van der Laan, H. Bakker, K. Morisaki, T. Oga

SPIE - The International Society of Optical Engineering
8 国際会議録 Characterization of Ni-P/TiO2 MMC Coatings Prepared by Electroless Plating Process on Mg-Nd-Zn-Zr Magnesium Alloys

X.W. Guo, S.H. Wang, H.Y. Yang, L.M. Peng, W.J. Ding

Trans Tech Publications
3 国際会議録 CD control enhancement by laser bandwidth stabilization for advanced lithography application

R. C. Peng, T. Wu, K. W. Chang, C. P. Yeh, H. H. Liu

Society of Photo-optical Instrumentation Engineers
9 国際会議録 Global pattern density effects on low-k trench CDs for sub-65-nm technology nodes [6152-05]

Hsu, J. W., Shieh, J. H., Doong, K. Y. Y., Hung, L. J., Lin, S. C., Ting, C. Y., Jang, S. M., Young, K. L., Liang, M. S.

SPIE - The International Society of Optical Engineering
4 国際会議録 Experimental study of line-end shortening

Shi, X., Socha, R. J., Bendik, J., Dusa, M. V., Conley, W., Su, B.

SPIE - The International Society of Optical Engineering
10 国際会議録 A novel method for fabricating periodic micro domain struture in a ferreoelectric crystal using a femtosecond laser [6034-25]

Peng H. L, Pan S. K, Leng Y. X, Ji H. J, Chen W., Lin L. H

SPIE - The International Society of Optical Engineering
5 国際会議録 Design and implementation of edge node in TBOBS

Guo, H., Lan, Z., Zhang, W., Yu, C., Gan, L., Liu, X., Wu, H., Wu, J., Lin, J.

SPIE - The International Society of Optical Engineering
11 国際会議録 Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Chou, S.-Y., Shin, J.-J., Shu, K.-C., You, J.-W., Shiu, L.-H., Chang, B.-C., Gau, T.-S., Lin, B.J.

SPIE - The International Society of Optical Engineering
6 国際会議録 Scatterometry measurements of line end shortening structures for focus-exposure monitoring [6152-70]

Hung, K., Cheng, Y. F., Sun, J. W., Lin, B. S. M., Fu, S., Dziura, T. G., Cusacovich, M., Mieher, W. D

SPIE - The International Society of Optical Engineering
12 国際会議録 Extending the limits of i-line lithography for via layers and minimization of dense-iso bias

Subramanian,R., Spence,C.A., Capodieci,L., Werner,T., Gallardo,E.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12