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Transistor-based electrical test structures for lithography and process characterization

著者名:
W. J. Poppe ( Univ. of California/Berkeley (USA) )
J. Holwill ( Univ. of California/Berkeley (USA) )
L. Pang ( Univ. of California/Berkeley (USA) )
P. Friedberg ( Univ. of California/Berkeley (USA) )
Q. Liu ( Univ. of California/Berkeley (USA) )
L. Alarcon ( Univ. of California/Berkeley (USA) )
A. Neureuther ( Univ. of California/Berkeley (USA) )
さらに 2 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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