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The calibration of process window model for 55-nm node

著者名:
T. H. Wu ( United Microelectronics Corp. (Taiwan) )
S. Y. Huang ( United Microelectronics Corp. (Taiwan) )
C. W. Huang ( United Microelectronics Corp. (Taiwan) )
P. R. Tsai ( United Microelectronics Corp. (Taiwan) )
C. H. Yang ( United Microelectronics Corp. (Taiwan) )
I. Y. Su ( Synopsys, Inc. (Taiwan) )
B. Falch ( Synopsys, Inc. (USA) )
さらに 2 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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