Double exposure using 193nm negative tone photoresist

Double exposure using 193nm negative tone photoresist

著者名:

R. Kim ( Advanced Micro Devices, Inc. (USA) )
T. Wallow ( Advanced Micro Devices, Inc. (USA) )
J. Kye ( Advanced Micro Devices, Inc. (USA) )
H. J. Levinson ( Advanced Micro Devices, Inc. (USA) )
D. White ( TOK America, Inc. (USA) )

掲載資料名:

Optical microlithography XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6520

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

言語:

英語

請求記号:

P63600/6520

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046827
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2007 : 20th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.02

類似資料:

1 国際会議録 Negative tone 193-nm photoresists Pugliano, N., Bolton, P.J., Barbieri, T., King, M., Reilly, M.T., Lawrence, W., Kang, D., Barclay, G.G. SPIE-The International Society for Optical Engineering	7 国際会議録 Negative-tone cycloolefin photoresist for 193-nm lithography Fu,S.C., Hsieh,K.H., Wang,L.A. SPIE-The International Society for Optical Engineering
2 国際会議録 Molecular weight tailoring in methacrylate 193-nm photoresists Wallow, T. I., Brock, P. J., Truong, H., Allen, R. D., Opitz, J., Hofer, D. C. SPIE - The International Society of Optical Engineering	8 国際会議録 New approaches to production-worthy 193-nm photoresists based on acrylic copolymers Wallow,T.I., Allen,R.D., Opitz,J., Dipietro,R.A., Brock,P.J., Sooriyakumaran,R., Hofer,D.C. SPIE-The International Society for Optical Engineering
3 国際会議録 Characterization of photo-acid redeposition in 193-nm photoresists T. Wallow, M. Plat, Z. Zhang, B. MacDonald, J. Bernard, J. Romero, B. L. Fontaine, H. J. Levinson SPIE - The International Society of Optical Engineering	9 国際会議録 Negative-tone 193-nm resists Cho,S., Heyden,A.Vander, Byers,J.D., Willson,C.G. SPIE - The International Society for Optical Engineering
4 国際会議録 Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications Joubert, O. P., Fuard, D., Monget, C., Schiavone, P., Toublan, O., Prola, A., Temerson, J. M., Inglebert, R. L., … SPIE - The International Society of Optical Engineering	10 国際会議録 The transfer of photoresist LER through etch [6153-45] Pawloski, A. R., Acheta, A., Bell, S., La Fontaine, B., Wallow, T., Levinson, H. J. SPIE - The International Society of Optical Engineering
5 国際会議録 Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. … SPIE - The International Society of Optical Engineering	11 国際会議録 193-nm negative resist based on acid-catalyzed elimination of polar molecules Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., … SPIE - The International Society of Optical Engineering
6 国際会議録 Approaches to etch-resistant 193-nm photoresists: performance and prospects Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., DiPietro, R. A., Brock, P. J., Breyta, G., … SPIE - The International Society of Optical Engineering	12 国際会議録 Development of high-performance negative-tone resists for 193-nm lithography Hattori, T., Yokoyama, Y., Kimura, K., Yamanaka, R., Tanaka, T., Fukuda, H. SPIE-The International Society for Optical Engineering

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