Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ= 193nm

Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ= 193nm

著者名:

G. Capetti ( STMicroelectronics (Italy) )

P. Cantu ( STMicroelectronics (Italy) )

E. Galassini ( STMicroelectronics (Italy) )

A. V. Pret ( STMicroelectronics (Italy) )

C. Turco ( STMicroelectronics (Italy) )

A. Vaccaro ( STMicroelectronics (Italy) )

P. Rigolli ( STMicroelectronics (Italy) )

F. D'Angelo ( STMicroelectronics (Italy) )

G. Cotti ( STMicroelectronics (Italy) )

さらに 4 件

掲載資料名:

Optical microlithography XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6520

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

言語:

英語

請求記号:

P63600/6520

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046827
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2007 : 20th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.02

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1 国際会議録 Combined mask and illumination scheme optimization for robust contact patterning on 45nm technology node flash memory devices A. Vaglio Pret, G. Capetti, M. Bollin, G. Cotti, D. De Simone Society of Photo-optical Instrumentation Engineers	7 国際会議録 Double patterning overlay and CD budget for 32 nm technology node U. Iessi, S. Loi, A. Salerno, P. Rigolli, E. De Chiara Society of Photo-optical Instrumentation Engineers
2 国際会議録 Alternated phase shift mask for 45nm node contact holes patterning [6154-162] Cantu, P., petti, G. Co, Catarisano, C., D’Angelo, F., Vaccaro, A. SPIE - The International Society of Optical Engineering	8 国際会議録 Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner Cantu, P., Capetti, G., Loi, S., Lupo, M., Pepe, A., Saitoh, K., Yamazoe, K., Hasegawa, Y., Iwasa, J., Toublan, O.R. SPIE - The International Society of Optical Engineering
3 国際会議録 Evaluation of double focal plane exposure technique for 248-nm and 193-nm lithography for semidense trenches and contacts Weisbuch, F., Enrichi, F., Capetti, G., Bianucci, G., Cotti, G. SPIE-The International Society for Optical Engineering	9 国際会議録 Double patterning with multilayer hard mask shrinkage for sub-0.25 k1 lithography H. J. Liu, W. H. Hsieh, C. H. Yeh, J. S. Wu, H. W. Chan, W. B. Wu, F. Y. Chen, T. Y. Huang, C. L. Shih, J. P. Lin SPIE - The International Society of Optical Engineering
4 国際会議録 Double patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ-193nm Maenhoudt, M., Versluijs, J., Struyf, H., Olmen, J. Van, Hove, M. Van SPIE - The International Society of Optical Engineering	10 国際会議録 Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2 S. Mimotogi, F. Uesawa, M. Tominaga, H. Fujise, K. Sho, M. Katsumata, H. Hane, A. Ikegami, S. Nagahara, T. Ema, M. … SPIE - The International Society of Optical Engineering
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