Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool
- 著者名:
T. Suzuki ( Komatsu Ltd. (Japan) ) K. Kakizaki ( Ushio Inc. (Japan) ) T. Matsunaga ( Komatsu Ltd. (Japan) ) S. Tanaka ( Ushio Inc. (Japan) ) Y. Kawasuji ( Komatsu Ltd. (Japan) ) M. Shimbori ( Ushio Inc. (Japan) ) M. Yoshino ( Ushio Inc. (Japan) ) T. Kumazaki ( Komatsu Ltd. (Japan) ) H. Umeda ( Komatsu Ltd. (Japan) ) H. Nagano ( Ushio Inc. (Japan) ) S. Nagai ( Komatsu Ltd. (Japan) ) Y. Sasaki ( Ushio Inc. (Japan) ) H. Mizoguchi ( Gigaphoton Inc. (Japan) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
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