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Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination

著者名:
H. Yune ( Hynix Semiconductor Inc. (South Korea) )
Y. Ahn ( Hynix Semiconductor Inc. (South Korea) )
D. Lee ( Hynix Semiconductor Inc. (South Korea) )
J. Moon ( Hynix Semiconductor Inc. (South Korea) )
B. Nam ( Hynix Semiconductor Inc. (South Korea) )
D. Yim ( Hynix Semiconductor Inc. (South Korea) )
さらに 1 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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