32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner
- 著者名:
Y. Trouiller ( LETI-CEA (France) ) V. Farys ( STMicroelectronics (France) ) A. Borjon ( Philips Semiconductors (France) ) J. Belledent ( Philips Semiconductors (France) ) C. Couderc ( Philips Semiconductors (France) ) F. Sundermann ( STMicroelectronics (France) ) J. Urbani ( STMicroelectronics (France) ) Y. Rody ( Philips Semiconductors (France) ) C. Gardin ( Freescale Semiconductor (France) ) J. Planchot ( STMicroelectronics (France) ) W. Conley ( Freescale Semiconductor (France) ) P. Goirand ( STMicroelectronics (France) ) S. Warrick ( Freescale Semiconductor (France) ) F. Robert ( STMicroelectronics (France) ) G. Kerrien ( STMicroelectronics (France) ) F. Vautrin ( STMicroelectronics (France) ) B. Wilkinson ( Freescale Semiconductor (France) ) M. Saied ( Freescale Semiconductor (France) ) E. Yesilada ( Freescale Semiconductor (France) ) P. Montgomery ( Freescale Semiconductor (France) ) L. L. Cam ( Philips Semiconductors (France) ) C. Martinelli ( STMicroelectronics (France) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
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国際会議録
Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]
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Improving model-based OPC performance for the 65-nm node through calibration set optimization
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