Extending immersion lithography to the 32-nm node
- 著者名:
S. Warrick ( Freescale Semiconductor (France) ) W. Conley ( Freescale Semiconductor (France) ) V. Farys ( ST Microelectronics (France) ) M. Benndorf ( NXP Semiconductors (France) ) J. Gemmink ( NXP Semiconductors (France) ) Y. Trouiller ( ST Microelectronics (France) ) J. Belledent ( NXP Semiconductors (France) ) D. Jovanovic ( Freescale Semiconductor (France) ) P. Gouraud ( ST Microelectronics (France) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
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8
国際会議録
Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |