Fast and accurate 3D mask model for full-chip OPC and verification
- 著者名:
P. Liu ( Brion Technologies, Inc. (USA) ) Y. Cao ( Brion Technologies, Inc. (USA) ) L. Chen ( Brion Technologies, Inc. (USA) ) G. Chen ( Brion Technologies, Inc. (USA) ) M. Feng ( Brion Technologies, Inc. (USA) ) J. Jiang ( Brion Technologies, Inc. (USA) ) H. Liu ( Brion Technologies, Inc. (USA) ) S. Suh ( Samsung Electronics, Co. LTD (South Korea) ) S. Lee ( Samsung Electronics, Co. LTD (South Korea) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
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