Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations
- 著者名:
K. Lucas ( Synopsys, Inc. (USA) ) C. Cork ( Synopsys SARL (France) ) J. Cobb ( Synopsys, Inc. (USA) ) B. Ward ( Synopsys, Inc. (USA) and IMEC (Belgium) ) M. Drapeau ( Synopsys, Inc. (Canada) ) C. Zhang ( Synopsys, Inc. (USA) ) J. Allgair ( International SEMATECH (USA) ) M. Kling ( Synopsys, Inc. (USA) ) M. Rieger ( Synopsys, Inc. (USA) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |