Some non-resist component contributions to LER and LWR in 193-nm lithography
- 著者名:
T. Kudo ( AZ Electronic Materials USA Corp. (USA) ) S. Chakrapani ( AZ Electronic Materials USA Corp. (USA) ) G. Lin ( AZ Electronic Materials USA Corp. (USA) ) C. Anyadiegwu ( AZ Electronic Materials USA Corp. (USA) ) C. Antonio ( AZ Electronic Materials USA Corp. (USA) ) D. Parthasarathy ( AZ Electronic Materials USA Corp. (USA) ) R. R. Dammel ( AZ Electronic Materials USA Corp. (USA) ) M. Padmanaban ( AZ Electronic Materials USA Corp. (USA) ) - 掲載資料名:
- Advances in resist materials and processing technology XXIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6519
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- 言語:
- 英語
- 請求記号:
- P63600/6519
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |