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Photoresist adhesion effect of resist reflow process

著者名:
J. Park ( Hanyang Univ. (South Korea) ) , ( Hynix Semiconductor Inc. (South Korea) )
J. Lee ( Hanyang Univ. (South Korea) )
M. Kim ( Seoul National Univ. (South Korea) )
J. Kim ( Seoul National Univ. (South Korea) )
S. Lee ( Seoul National Univ. (South Korea) )
C. Bok ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
S. Park ( Hanyang Univ. (South Korea) )
J. Hong ( Hanyang Univ. (South Korea) )
H. Oh ( Hanyang Univ. (South Korea) )
さらに 5 件
掲載資料名:
Advances in resist materials and processing technology XXIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6519
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
言語:
英語
請求記号:
P63600/6519
資料種別:
国際会議録

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