Effect of novel rinsing material and surfactant treatment on the resist pattern performance
- 著者名:
V. Huang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) C. C. Chiu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) C. A. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) C. Y. Chang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) T. S. Gau ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) B. J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- Advances in resist materials and processing technology XXIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6519
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- 言語:
- 英語
- 請求記号:
- P63600/6519
- 資料種別:
- 国際会議録
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