Formulated surface conditioners in 50 nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness
- 著者名:
M. Sugiyama ( Sokudo, Co., Ltd. (Japan) ) M. Sanada ( Sokudo, Co., Ltd. (Japan) ) S. Wang ( ASML Netherlands B.V. (Netherlands) ) P. Wong ( ASML Netherlands B.V. (Netherlands) ) S. Sinkwitz ( ASML Netherlands B.V. (Netherlands) ) M. Jaramillo, Jr. ( Air Products and Chemicals, Inc. (USA) ) G. Parris ( Air Products and Chemicals, Inc. (USA) ) - 掲載資料名:
- Advances in resist materials and processing technology XXIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6519
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- 言語:
- 英語
- 請求記号:
- P63600/6519
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
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