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Polymer structure modifications for immersion leaching control

著者名:
S. H. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
J. W. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
S. K. Oh ( Dongjin Semichem Co. Ltd. (South Korea) )
C. S. Park ( Dongjin Semichem Co. Ltd. (South Korea) )
J. Y. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
S. S. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. W. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
D. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
K. D. Ban ( Hynix Semiconductor Co., Ltd. (South Korea) )
C. K. Bok ( Hynix Semiconductor Co., Ltd. (South Korea) )
S. C. Moon ( Hynix Semiconductor Co., Ltd. (South Korea) )
さらに 7 件
掲載資料名:
Advances in resist materials and processing technology XXIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6519
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
言語:
英語
請求記号:
P63600/6519
資料種別:
国際会議録

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1 国際会議録 Polymer structure modifications for immersion leaching and watermark control [6153-77]

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7 国際会議録 First microprocessors with immersion lithography

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2 国際会議録 Modified polymer architecture for immersion lithography

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9 国際会議録 Optimization of material and process parameter for minimizing defect in implementation of MFHM process

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4 国際会議録 Study on the reduction of defects in immersion lithography

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10 国際会議録 Photoresist adhesion effect of resist reflow process

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11 国際会議録 Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73]

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