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Modified polymer architecture for immersion lithography

著者名:
S. S. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. W. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. Y. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
S. K. Oh ( Dongjin Semichem Co. Ltd. (South Korea) )
S. H. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
J. W. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
D. bae Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
K. D. Ban ( Hynix Semiconductor Inc. (South Korea) )
C. K. Bok ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
さらに 6 件
掲載資料名:
Advances in resist materials and processing technology XXIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6519
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
言語:
英語
請求記号:
P63600/6519
資料種別:
国際会議録

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1 国際会議録 Polymer structure modifications for immersion leaching control

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