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Study on the reduction of defects in immersion lithography

著者名:
K. Ban ( Hynix Semiconductor Inc. (South Korea) )
S. Park ( Hynix Semiconductor Inc. (South Korea) )
C. Bok ( Hynix Semiconductor Inc. (South Korea) )
H. Lim ( Hynix Semiconductor Inc. (South Korea) )
J. Heo ( Hynix Semiconductor Inc. (South Korea) )
H. Chun ( Hynix Semiconductor Inc. (South Korea) )
J. Kang ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
さらに 3 件
掲載資料名:
Advances in resist materials and processing technology XXIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6519
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
言語:
英語
請求記号:
P63600/6519
資料種別:
国際会議録

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