A new SEM CD operator verified against Monte Carlo simulations
- 著者名:
- C. G. Frase ( Physikalisch-Technische Bundesanstalt (Germany) )
- D. Gnieser ( Physikalisch-Technische Bundesanstalt (Germany) )
- K. Dirscherl ( Danish Fundamental Metrology, Ltd. (Denmark) )
- E. Buhr ( Physikalisch-Technische Bundesanstalt (Germany) )
- H. Bosse ( Physikalisch-Technische Bundesanstalt (Germany) )
- 掲載資料名:
- Metrology, inspection, and process control for microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6518
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- 言語:
- 英語
- 請求記号:
- P63600/6518
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |