Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique
- 著者名:
Y. Jeon ( DongbuElectronics (South Korea) ) S. Jun ( DongbuElectronics (South Korea) ) J. Kang ( DongbuElectronics (South Korea) ) S. Lee ( DongbuElectronics (South Korea) ) J. Kim ( DongbuElectronics (South Korea) ) K. Kim ( DongbuElectronics (South Korea) ) - 掲載資料名:
- Metrology, inspection, and process control for microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6518
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- 言語:
- 英語
- 請求記号:
- P63600/6518
- 資料種別:
- 国際会議録
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