Robust sub-50-nm CD control by a fast-goniometric scatterometry technique

Robust sub-50-nm CD control by a fast-goniometric scatterometry technique

著者名:

J. Hazart ( CEA-LETI Minatec (France) )

P. Barritault ( CEA-LETI Minatec (France) )

S. Garcia ( CEA-LETI Minatec (France) )

T. Leroux ( ELDIM (France) )

P. Boher ( ELDIM (France) )

K. Tsujino ( OMRON Corp. (Japan) )

さらに 1 件

掲載資料名:

Metrology, inspection, and process control for microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6518

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

言語:

英語

請求記号:

P63600/6518

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046825
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2007 : 21st
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.26-2007.03.01

類似資料:

1 国際会議録 Innovative rapid photogoniometry method for CD metrology Boher, P., Luet, M., Leroux, T., Petit, J., Barritault, P., Hazart, J., Chaton, P. SPIE - The International Society of Optical Engineering	7 国際会議録 Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., … SPIE-The International Society for Optical Engineering
2 国際会議録 A new analysis strategy for CD metrology using rapid photo goniometry method Petit, J., Barritault, P., Hazart, J., Chaton, P., Boher, P., Luet, M., Leroux, T. SPIE - The International Society of Optical Engineering	8 国際会議録 Successful application of angular scatterometry to process control in sub-100-nm DRAM device Kim, J.-, Kim, S.-J., Chin, S.-B., Oh, S.-H., Goo, D.-H., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T., … SPIE - The International Society of Optical Engineering
3 国際会議録 Rapid photo-goniometric technique for LED emission characterization Boher, P., Luet, M., Leroux, T. SPIE - The International Society of Optical Engineering	9 国際会議録 Comparison of spectroscopic Mueller polarimetry, standard scatterometry, and real space imaging techniques (SEM and 30-AFM) for dimensional characterization of … A. De Martino, M. Foldyna, T. Novikova, D. Cattelan, P. Barritault Society of Photo-optical Instrumentation Engineers
4 国際会議録 Spectroscopic ellipsometric scatterometry: sources of errors in critical dimension control Hazart, J., Grand, G., Thony, P., Herisson, D., Garcia, S., Lartigue, O. SPIE-The International Society for Optical Engineering	10 国際会議録 90nm technology contact CD performance characterization via ODP scatterometry Jeon, B.-T., Kim, O.-H., Baik, J.-H., Ha, J.-H., Lee, I.-H., Yang, W.-S. SPIE - The International Society of Optical Engineering
5 国際会議録 Application of scatterometry for CD and profile metrology in 193-nm lithography process development Chen, L.-J., Ke, C.-M., Yu, S.S., Gau, T.-S., Chen, P., Ku, Y.-C., Lin, B.J., Engelhard, D., Hetzer, D., Yang, J.Y., … SPIE-The International Society for Optical Engineering	11 国際会議録 Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results C. Wang, R. L. Jones, E. K. Lin, W. Wu, J. S. Villarrubia, K. Choi, J. S. Clarke, B. J. Rice, M. Leeson, J. Roberts, R. … SPIE - The International Society of Optical Engineering
6 国際会議録 Mask process monitoring with optical CD measurements for sub-50-nm K.-Y. Bang, J.-B. Park, J.-H. Roh, D.-H. Chung, S.-Y. Cho Society of Photo-optical Instrumentation Engineers	12 国際会議録 Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements Coulombe,S.A., Logofatu,P.C., Minhas,B.K., Naqvi,S.S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12