Improvement of front-end process overlay in 60nm DRAM
- 著者名:
Y. Hwang ( Hynix Semiconductor Industries Co., Ltd. (South Korea) ) W. Ma ( Hynix Semiconductor Industries Co., Ltd. (South Korea) ) E. Kang ( Hynix Semiconductor Industries Co., Ltd. (South Korea) ) C. Lim ( Hynix Semiconductor Industries Co., Ltd. (South Korea) ) S. Moon ( Hynix Semiconductor Industries Co., Ltd. (South Korea) ) S. An ( ASML (South Korea) ) K. Rhe ( ASML (South Korea) ) - 掲載資料名:
- Metrology, inspection, and process control for microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6518
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- 言語:
- 英語
- 請求記号:
- P63600/6518
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |