Metrology challenges for advanced lithography techniques
- 著者名:
I. Englard ( Applied Materials Europe (Netherlands) ) P. Vanoppen ( ASML Netherlands (Netherlands) ) J. Finders ( ASML Netherlands (Netherlands) ) I. Minnaert-Janssen ( ASML Netherlands (Netherlands) ) F. Duray ( ASML Netherlands (Netherlands) ) J. Meessen ( ASML Netherlands (Netherlands) ) G. Janssen ( ASML Netherlands (Netherlands) ) O. Adan ( Applied Materials Europe (Israel) ) L. Gershtein ( Applied Materials Europe (Israel) ) R. Peltinov ( Applied Materials Europe (Israel) ) C. Masia ( Applied Materials Europe (Israel) ) R. Piech ( Applied Materials Europe (Netherlands) ) - 掲載資料名:
- Metrology, inspection, and process control for microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6518
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- 言語:
- 英語
- 請求記号:
- P63600/6518
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Advanced .CDSEM matching methodology for OPC litho-cell-based matching verification [6152-106]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
10
国際会議録
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |