Lithography process control using scatterometry metrology and semi-physical modeling

Lithography process control using scatterometry metrology and semi-physical modeling

著者名:

K. Lensing ( Advanced Micro Devices (USA) )

J. Cain ( Advanced Micro Devices (USA) )

A. Prabhu ( Advanced Micro Devices (USA) )

A. Vaid ( Advanced Micro Devices (USA) )

R. Chong ( Advanced Micro Devices (USA) )

R. Good ( Advanced Micro Devices (USA) )

B. LaFontaine ( Advanced Micro Devices (USA) )

O. Kritsun ( Advanced Micro Devices (USA) )

さらに 3 件

掲載資料名:

Metrology, inspection, and process control for microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6518

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

言語:

英語

請求記号:

P63600/6518

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046825
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2007 : 21st
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.26-2007.03.01

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