Polarization dependence of multilayer reflectance in the EUV spectral range

Polarization dependence of multilayer reflectance in the EUV spectral range

著者名:

F. Scholze ( Physikalisch-Technische Bundesanstalt (Germany) )

C. Laubis ( Physikalisch-Technische Bundesanstalt (Germany) )

C. Buchholz ( Physikalisch-Technische Bundesanstalt (Germany) )

A. Fischer ( Physikalisch-Technische Bundesanstalt (Germany) )

A. Kampe ( Physikalisch-Technische Bundesanstalt (Germany) )

S. Ploger ( Physikalisch-Technische Bundesanstalt (Germany) )

F. Scholz ( Physikalisch-Technische Bundesanstalt (Germany) )

G. Ulm ( Physikalisch-Technische Bundesanstalt (Germany) )

さらに 3 件

掲載資料名:

Emerging lithographic technologies XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6517

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

言語:

英語

請求記号:

P63600/6517

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046824
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2007 : 11th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.01

類似資料:

1 国際会議録 Polarization dependence of multilayer reflectance in the EUV spectral range [6151-111] Scholze, F., Laubis, C., Buchholz, C., Fischer, A., Ploger, S, Scholz, F, Ulm, G SPIE - The International Society of Optical Engineering	7 国際会議録 Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasks F. Scholze, C. Laubis Society of Photo-optical Instrumentation Engineers
2 国際会議録 Low thermal expansion substrate material for EUVL components application Scholze, F., Laubis, C., Buchholz, C., Fischer, A., Ploger, S., Scholz, F., Wagner, H., Ulm, G. SPIE - The International Society of Optical Engineering	8 国際会議録 Spectral responsivity of silicon photodiodes:high-accuracy measurement and improved self-calibration in the soft x-ray spectral range Scholze,F., Rabus,H., Ulm,G. SPIE-The International Society for Optical Engineering
3 国際会議録 Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB[6151-18] Laubis, C., Buchholz, C., Fischer, A., Ploger, S., Scholz, F., Wagner, H., Scholze, F., Ulm, G., Enkisch, H., Mullender, … SPIE - The International Society of Optical Engineering	9 国際会議録 Metrotogy of EUV masks by EUV-scatterometry and finite element analysis J. Pomplun, S. Burger, F. Schmidt, F. Scholze, C. Laubis Society of Photo-optical Instrumentation Engineers
4 国際会議録 Metrology in the soft x-ray range: from EUV to the water window C. Laubis, F. Scholze, G. Ulm Society of Photo-optical Instrumentation Engineers	10 国際会議録 Finite element analysis of EUV lithography J. Pomplun, S. Burger, F. Schmidt, F. Scholze, C. Laubis, U. Dersch SPIE - The International Society of Optical Engineering
5 国際会議録 Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM simulation F. Scholze, C. Laubis, G. Ulm, U. Dersch, J. Pomplun Society of Photo-optical Instrumentation Engineers	11 国際会議録 Detector calibration at the radiometry laboratory of the Physikalisch-Technische Bundesanstalt in the VUV and soft x-ray spectral ranges using synchrotron … T. Lederer, H. Rabus, F. Scholze, R. Thornagel, G. Ulm Society of Photo-optical Instrumentation Engineers
6 国際会議録 Multilayer reflectance during exposure to EUV radiation Oestreich,S., Klein,R., Scholze,F., Jonkers,J., Louis,E., Yakshin,A.E., Gorts,P.C., Ulm,G., Haidl,M., Bijkerk,F. SPIE-The International Society for Optical Engineering	12 国際会議録 High-accuracy detector calibration for EUV metrology at PTB Scholze, F., Brandt, G.M., Mueller, P., Meyer, B., Scholz, F., Tuemmler, J., Vogel, K., Ulm, G. SPIE-The International Society for Optical Engineering

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