mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

著者名:

C. Schuster ( micro resist technology GmbH (Germany) )
M. Kubenz ( micro resist technology GmbH (Germany) )
F. Reuther ( micro resist technology GmbH (Germany) )
M. Fink ( micro resist technology GmbH (Germany) )
G. Gruetzner ( micro resist technology GmbH (Germany) )

掲載資料名:

Emerging lithographic technologies XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6517

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

言語:

英語

請求記号:

P63600/6517

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046824
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2007 : 11th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.01

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1 国際会議録 Nanoimprinting with SU-8 epoxy resists D. W. Johnson, H. Miller, M. Kubenz, F. Reuther, G. Gruetzner SPIE - The International Society of Optical Engineering	7 国際会議録 Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing M. Vogler, M. Bender, U. Plachetka, A. Fuchs, S. Wiedenberg, F. Reuther, G. Grutzner, H. Kurz SPIE - The International Society of Optical Engineering
2 国際会議録 Perfluoropolyethers as novel materials for soft lithography Reuther, F., Kubenz, M., Schuster, C., Fink, M., Vogler, M., Gruetzner, G., Grimm, J., Kaeppel, A. SPIE - The International Society of Optical Engineering	8 国際会議録 A Vinyl ether resist system for UV -cured nanoimprint lithography [6153-47] Ito, H., Houle, F. A., Hart, M. W., Dipietro, R. A. SPIE - The International Society of Optical Engineering
3 国際会議録 Mix and match of nanoimprint and UV lithography Reuther,F., Pfeiffer,K., Fink,M., Gruetzner,G., Schulz,H., Scheer,H.-C., Gaboriau,F., Cardinaud,C. SPIE-The International Society for Optical Engineering	9 国際会議録 Template flatness issue for UV curing nanoimprint lithography P. Voisin, A. Jouve, M. Zelsmann, C. Gourgon, J. Boussey SPIE - The International Society of Optical Engineering
4 国際会議録 Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials A. Klukowska, M. Vogler, A. Kolander, F. Reuther, G. Gruetzner Society of Photo-optical Instrumentation Engineers	10 国際会議録 Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist A. Voigt, J. Kouba, M. Heinrich, G. Gruetzner, H.-U. Scheunemann Society of Photo-optical Instrumentation Engineers
5 国際会議録 Challenges of processing thick and ultrathick photoresist films Kubenz, M., Ostrzinski, U., Reuther, F., Gruetzner, G. SPIE-The International Society for Optical Engineering	11 国際会議録 Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions F. A. Houle, A. fornof, D. C. Miller, S. Raoux, H. Truong Society of Photo-optical Instrumentation Engineers
6 国際会議録 Reactive polymers: a route to nanoimprint lithography at low temperatures Pfeiffer, K., Reuther, F., Carlberg, P., Fink, M., Gruetzner, G., Montelius, L. SPIE-The International Society for Optical Engineering	12 国際会議録 B Adhesion between template materials and UV -cured nanoimprint resists [6153-48] Houle, F. A., Guyer, E., Miller, D. C., Dauskardt, R., Rice, E., Hamilton, J. SPIE - The International Society of Optical Engineering

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