Nanoimprinting with SU-8 epoxy resists
- 著者名:
- D. W. Johnson ( MicroChem Corp. (USA) )
- H. Miller ( MicroChem Corp. (USA) )
- M. Kubenz ( micro resist technology GmbH (Germany) )
- F. Reuther ( micro resist technology GmbH (Germany) )
- G. Gruetzner ( micro resist technology GmbH (Germany) )
- 掲載資料名:
- Emerging lithographic technologies XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6517
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466365 [0819466360]
- 言語:
- 英語
- 請求記号:
- P63600/6517
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
8
国際会議録
Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |