Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing

Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing

著者名:

M. Vogler ( micro resist technology GmbH (Germany) )

M. Bender ( AMO GmbH (Germany) )

U. Plachetka ( AMO GmbH (Germany) )

A. Fuchs ( AMO GmbH (Germany) )

S. Wiedenberg ( micro resist technology GmbH (Germany) )

F. Reuther ( micro resist technology GmbH (Germany) )

G. Grutzner ( micro resist technology GmbH (Germany) )

H. Kurz ( AMO GmbH (Germany) )

さらに 3 件

掲載資料名:

Emerging lithographic technologies XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6517

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

言語:

英語

請求記号:

P63600/6517

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046824
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2007 : 11th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.01

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