The effect of localized mask density variations on image quality in EUV lithography

The effect of localized mask density variations on image quality in EUV lithography

著者名:

J. Park ( Samsung Electronics Co., Ltd. (South Korea) )
H. Seo ( Samsung Electronics Co., Ltd. (South Korea) )
S. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
H. Cho ( Samsung Electronics Co., Ltd. (South Korea) )
J. Moon ( Samsung Electronics Co., Ltd. (South Korea) )

掲載資料名:

Emerging lithographic technologies XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6517

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

言語:

英語

請求記号:

P63600/6517

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046824
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2007 : 11th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.01

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1 国際会議録 Simulation and experiments for inspection properties of EUV mask defects [6283-85] Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J. SPIE - The International Society of Optical Engineering	7 国際会議録 OPC to account for thick mask effect using simplified boundary layer model [6349-133] Kim, S., Kim, Y.-C., Suh, S., Lee, S., Cho, H., Moon, J., Cobb, J. SPIE - The International Society of Optical Engineering
2 国際会議録 Mask topography effect on OPC at hyper NA lithography [6154-64] Lee S, Kim I. S, Chun Y. J, Kim S.-W, Lee S.J, Wood, S.-G, Cho H. K, Moon J.-T SPIE - The International Society of Optical Engineering	8 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
3 国際会議録 Fabrication of membrane mask for next-generation lithography Kim,D., Lera,J.D., Cho,H., Moon,J. SPIE - The International Society for Optical Engineering	9 国際会議録 Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator Kim, M.-Y., Ki, W.-T., Lee, S.-H., Choi, J.-H., Choi, S.-W., Sohn, J.-M. SPIE - The International Society of Optical Engineering
4 国際会議録 Properties of EUVL masks as a function of capping layer and absorber stack structures H. Seo, J. Park, S. Lee, H. Kim, S. Kim, H. Cho SPIE - The International Society of Optical Engineering	10 国際会議録 Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world Kim, I.-S., Jung, S.-G., Kim, H.-D., Yeo, G.-S., Shin, I.-K., Lee, J.-H., Cho, H.-K., Moon, J.-T. SPIE-The International Society for Optical Engineering
5 国際会議録 Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF Park,J., Yeo,G., Kim,I., Kim,B.-S., Lee,J., Cho,H., Moon,J.T. SPIE-The International Society for Optical Engineering	11 国際会議録 Practical methodology of optical proximity correction in subquarter-micron lithography Lim,C.-M., Seo,J.-W., Kang,C.-S., Park,Y.-S., Yoon,J.-T., Lee,C.-S., Moon,S.-C., Kim,B.-H. SPIE - The International Society for Optical Engineering
6 国際会議録 First microprocessors with immersion lithography Lee, D.-Y., Kim, I.-S., Jung, S.-G., Jung, M.-H., Park, J.-O., Oh, S.-H., Woo, S.-G., Cho, H.-K., Moon, J.-T. SPIE - The International Society of Optical Engineering	12 国際会議録 Characteristics and prevention of pattern collapse in EUV lithography W. Chang, E. Kim, Y. Kang, S. Park, C. Lim, K. Won, J. Kim, H. Oh SPIE - The International Society of Optical Engineering

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