Analysis and Optimization of New Implantation and Activation Mechanisms in Ultra Shallow Junction Implants Using Scanning Spreading Resistance Microscopy (SSRM)

Analysis and Optimization of New Implantation and Activation Mechanisms in Ultra Shallow Junction Implants Using Scanning Spreading Resistance Microscopy (SSRM)

著者名:

Pierre Eyben

掲載資料名:

Doping engineering for device fabrication : symposium held April 18-19, 2006, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

912

発行年:

2006

開始ページ:

203

終了ページ:

210

総ページ数:

8

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558998681 [1558998683]

言語:

英語

請求記号:

M23500/912

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046616
シリーズID:	PA00000011
会議名:	MRS Spring Meeting : Symposium C
回次:	2006
会議開催地:	San Francisco, California, USA
会議開催年:	2006.04.18-2006.04.19

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