Roughness, Impurities and Strain in Low-Temperature Epitaxial Silicon Films Grown by Tantalum Filament Hot-Wire Chemical Vapor Deposition
- 著者名:
Charles W. Teplin Matthew W. Page Eugene W. Iwaniczko Kim M. Jones Robert M. Ready Bobby M. To Helio M. Moutinho Qi M. Wang Howard M. Branz - 掲載資料名:
- Amorphous and polycrystalline thin-film silicon science and technology--2006 : symposium held April 18-21, 2006, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 910
- 発行年:
- 2007
- 開始ページ:
- 343
- 終了ページ:
- 352
- 総ページ数:
- 10
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558998667 [1558998667]
- 言語:
- 英語
- 請求記号:
- M23500/910
- 資料種別:
- 国際会議録
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