Dual-Chamber Plasma Co-Deposition of Nanoparticles in Amorphous Silicon Thin Films

Dual-Chamber Plasma Co-Deposition of Nanoparticles in Amorphous Silicon Thin Films

著者名:

C. Anderson

掲載資料名:

Amorphous and polycrystalline thin-film silicon science and technology--2006 : symposium held April 18-21, 2006, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

910

発行年:

2007

開始ページ:

79

終了ページ:

84

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558998667 [1558998667]

言語:

英語

請求記号:

M23500/910

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046614
シリーズID:	PA00000011
会議名:	MRS Spring Meeting : Symposium A
回次:	2006
会議開催地:	San Francisco, California, USA
会議開催年:	2006.04.18-2006.04.21

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2 国際会議録 Experimental Study of Silane Plasma Nanoparticle Formation in Amorphous Silicon Thin Films Thompson, S., Perrey, C.R., Belich, T.J., Blackwell, C., Carter, C.B., Kakalios, J., Kortshagen, U. Materials Research Society	8 国際会議録 Thermoelectric Properties of Doped and Undoped Mixed Phase Hydrogenated Amorphous/nanocrystalline Silicon Thin Films J. Kakalios, Y. Adjallah, C. Blackwell Materials Research Society
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