The Mechanism of Interface State Passivation by NO
- 著者名:
P. Deak T. Hornos C. Thill J. Knaup A. Gali T. Frauenheim - 掲載資料名:
- Silicon carbide and related materials 2006 : ECSCRM 2006, Proceedings of the 6th European Conference on Silicon Carbide and Related Materials, Newcastle upon Tyne, UK, September 2006
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 556-557
- 発行年:
- 2007
- 開始ページ:
- 541
- 終了ページ:
- 544
- 総ページ数:
- 4
- 出版情報:
- Stafa-Zuerich: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9780878494422 [0878494421]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
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3
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The Search for Near Interface Oxide Traps - First-Principles Calculations on Intrinsic SiO2 Defects
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