Plasma Etching for the Application to Low-K Dielectrics Devices

Plasma Etching for the Application to Low-K Dielectrics Devices

著者名:

掲載資料名:

Research trends in contemporary materials science : YUCOMAT VIII : selected papers presented at the 8th Conference of the Yugoslav Materials Research Society, held in Herceg Novi, Montenegro September 4-8, 2006

シリーズ名:

Materials science forum

シリーズ巻号:

555

発行年:

2007

開始ページ:

113

終了ページ:

118

総ページ数:

6

出版情報:

Stafa-Zuerich, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878494415 [0878494413]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046609
シリーズID:	PA00000012
会議名:	Yugoslav Materials Research Society Conference
回次:	2006 : 8th
会議開催地:	Herceg Novi, Montenegro
会議開催年:	2006.09.04-2006.09.08

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