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Meeting critical gate Iinewidth control needs at the 65 nm node [6156-23]

著者名:
Mahorowala, A. ( IBM Systems and Technology Group (USA) )
Halle, S. ( IBM Systems and Technology Group (USA) )
Gabor, A. ( IBM Systems and Technology Group (USA) )
Chu, W. ( IBM Systems and Technology Group (USA) )
Barberet, A. ( IBM Systems and Technology Group (USA) )
Samuels, D. ( IBM Systems and Technology Group (USA) )
Abdo, A. ( IBM Systems and Technology Group (USA) )
Tsou, L. ( IBM Systems and Technology Group (USA) )
Yan, W. ( IBM Systems and Technology Group (USA) )
Iseda, S. ( Sony Electronics Inc (USA) )
Patel K ( IBM IBM Systems and Technology Group (USA) )
Dirahoui, B ( IBM IBM Systems and Technology Group (USA) )
Nomura, A ( Advanced Mirco Devices Inc (USA) )
Ahsan, I ( IBM IBM Systems and Technology Group (USA) )
Azam, F ( IBM IBM Systems and Technology Group (USA) )
Berg, G ( IBM IBM Systems and Technology Group (USA) )
Brendler, A ( IBM IBM Systems and Technology Group (USA) )
Zimmerman, J ( IBM IBM Systems and Technology Group (USA) )
Faure, T ( IBM IBM Systems and Technology Group (USA) )
さらに 14 件
掲載資料名:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6156
発行年:
2006
開始ページ:
61560M
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
言語:
英語
請求記号:
P63600/6156
資料種別:
国際会議録

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