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Toward DFM: process worthy design and OPC through verification method using MEEF, TF・MEEF, and MTT [6156-21]

著者名:
Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Suh, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Jung, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, E. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, Y.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 3 件
掲載資料名:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6156
発行年:
2006
開始ページ:
61560L
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
言語:
英語
請求記号:
P63600/6156
資料種別:
国際会議録

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