Lithography oriented DfM for 65 nm and beyond [6156-14]
- 著者名:
- Kyoh, S. ( Toshiba Corp.,Semiconductor Co. (Japan) )
- Kotani, T. ( Toshiba Corp.,Semiconductor Co. (Japan) )
- Kobayashi, S. ( Toshiba Corp.,Semiconductor Co. (Japan) )
- Ikeuchi, A. ( Toshiba Corp.,Semiconductor Co. (Japan) )
- Inoue, S. ( Toshiba Corp.,Semiconductor Co. (Japan) )
- 掲載資料名:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6156
- 発行年:
- 2006
- 開始ページ:
- 61560F
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- 言語:
- 英語
- 請求記号:
- P63600/6156
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |