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Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering [6149-100]

著者名:
  • Xu, J. ( Northwestern Polytechnical Univ.(China) and Xi’an Institute of Technology (China) )
  • Hang, L. ( Xi’an Institute of Technology (China) )
  • Liu, W. ( Xi’an Institute of Technology (China) )
  • Fan, H. ( Northwestern Polytechnical Univ.(China) )
  • Xing, Y. ( Xi’an Institute of Technology (China) )
掲載資料名:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6149
発行年:
2006
開始ページ:
61492S
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461889 [0819461881]
言語:
英語
請求記号:
P63600/6149
資料種別:
国際会議録

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