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Aerial image based mask defect detection in dense array structures [5853-85]

著者名:
Kohle, R. ( Infineon Technologies AG (Germany) )
Hennig, M.
Pforr, R. ( lnfineon Technologies SC 300 GmbH and Co. OHG (Germany) )
Bubke, K.
Sczyrba, M.
Durr, A. C. ( Advanced Mask Technology Ctr. (Germany) )
さらに 1 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5853
発行年:
2005
パート:
2
開始ページ:
953
終了ページ:
964
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
言語:
英語
請求記号:
P63600/5853
資料種別:
国際会議録

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