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Application of CPL mask for whole chip 5nm DRAM patterning [5853-69]

著者名:
Lin, 0. ( Toppan Chunghwa Electronics Corp. (Taiwan) )
Hung, R. ( Nanya Technology Corp. (Taiwan) )
Lee, B. ( Toppan Chunghwa Electronics Corp. (Taiwan) )
Wu, Y.-H. ( Nanya Technology Corp. (Taiwan) )
Kozuma, M. ( Toppan Chunghwa Electronics Corp. (Taiwan) )
Shih, C.-L.
Lin, J. ( Nanya Technology Corp. (Taiwan) )
Hsu, M.
Hsu, S. D. ( ASML MaskTools, Inc. (USA) )
さらに 4 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5853
発行年:
2005
パート:
2
開始ページ:
835
終了ページ:
843
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
言語:
英語
請求記号:
P63600/5853
資料種別:
国際会議録

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