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Precision process calibration and CD predictions for low-k1 lithography [5853-64]

著者名:
Chen, T.
Park, S.
Berger, G.
Coskun, T. H.
de Vocht, J.
Chen, F.
Yu, L.
Hsu, S.
van den Broeke, D. ( ASML MaskTools (USA) )
Socha, R. ( ASML TDC (USA) )
Park, J.
Gronlund, K. ( ASML MaskTools (USA) )
Davis, T.
Plachecki, V.
Harris, T. ( ASML (USA) )
Hansen, S. ( ASML TDC (USA) )
Lambson, C. ( ASML (USA) )
さらに 12 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5853
発行年:
2005
パート:
2
開始ページ:
785
終了ページ:
799
総ページ数:
15
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
言語:
英語
請求記号:
P63600/5853
資料種別:
国際会議録

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