The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]
- 著者名:
Yoon, G.-S. Kim, S.-H. Park, J.-S. Choi, S.-Y. Jean, C.-U. Shin, I.-K. Choi, S.-W. Han, W.-S. ( Samsung Electronics (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 703
- 終了ページ:
- 713
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
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4
国際会議録
Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
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