Flexible sparse and dense OPC algorithms [5853-54]

Flexible sparse and dense OPC algorithms [5853-54]

著者名:: Cobb, N. ( Mentor Graphics Corp. (USA) )
掲載資料名:: Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:: 5853
発行年:: 2005
パート:: 2
開始ページ:: 693
終了ページ:: 702
総ページ数:: 10
出版情報:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819458537 [0819458538]
言語:: 英語
請求記号:: P63600/5853
資料種別:: 国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

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