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Patterning of Ta/Si02 high transmission EAPSM material for 193nm technology [5853-26]

著者名:
Koepernik, C. ( IMS Chips (Germany) )
Becker, H. W. ( Schott Lithotec (Germany) )
Butschke, J. ( MS Chips (Germany) )
Buttgereit, U. ( Schott Lithotec (Germany) )
Irmscher, M.
Nedelmann, L. ( IMS Chips (Germany) )
Schmidt, F. ( Schott Lithotec (Germany) )
Teuber, S. ( Advanced Mask Technology Ctr. (Germany) )
さらに 3 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5853
発行年:
2005
パート:
1
開始ページ:
463
終了ページ:
473
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
言語:
英語
請求記号:
P63600/5853
資料種別:
国際会議録

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