Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]

Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]

著者名:

Edinger, K.
Boegli, V. ( NaWoTec GmbH (Germany) )
Degel, W. ( Carl Zeiss SMS GmbH (Germany) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

1

開始ページ:

361

終了ページ:

370

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

類似資料:

1 国際会議録 Application data of the electron beam based photomask repair tool MeRiT MG Ehrlich, C., Edinger, K., Boegli, V., Kuschnerus, P. SPIE - The International Society of Optical Engineering	7 国際会議録 Electron-beam-induced processes and their applicability to mask repair Boegli, V.A., Koops, H.W.P., Budach, M., Edinger, K., Hoinkis, O., Weyrauch, B., Becker, R., Schmidt, R., Kaya, A., … SPIE-The International Society for Optical Engineering
2 国際会議録 Recent apploaction resulta from the novel e-beam based mask repair system MeRiT MG [6281-28] Ehrlich, C., Edinger, K., Hofmann, T., Degel, W. SPIE - The International Society of Optical Engineering	8 国際会議録 Electron beam directed repair of fused silica imprint templates G. M. Schmid, D. J. Resnick, R. Fettig, K. Edinger, S. R. Young, W. J. Dauksher SPIE - The International Society of Optical Engineering
3 国際会議録 Electron-beam mask repair with induced reactions Koops, H.W.P., Edinger, K., Bihr, J., Boegli, V.A., Greiser, J. SPIE-The International Society for Optical Engineering	9 国際会議録 Advanced process capabilities for electron beam based photomask repair in a production environment A. Garetto, C. Baur, J. Oster, M. Waiblinger, K. Edinger Society of Photo-optical Instrumentation Engineers
4 国際会議録 Application of electron-beam-induced processes to mask repair Edinger, K., Boegli, V.A., Budach, M., Hoinkis, O., Weyrauch, B., Koops, H.W.P., Bihr, J., Greiser, J. SPIE-The International Society for Optical Engineering	10 国際会議録 Mask repair using layout-based pattern copy for the 65-nm node and beyond [6349-52] Boegli, V., Auth, N., Hofmann, U. SPIE - The International Society of Optical Engineering
5 国際会議録 A novel electron-beam-based photomask repair tool Edinger, K., Becht, H., Becker, R., Bert, V., Boegli, V.A., Budach, M., Gyhde, S., Guyot, J., Hofmann, T., Hoinkis, O., … SPIE - The International Society of Optical Engineering	11 国際会議録 Integrated photomask defect printability check, mask repair, and repair validation procedure for phase-shifting masks for the 45-nm node and beyond C. Ehrlich, U. Buttgereit, K. Boehm, T. Scheruebl, K. Edinger Society of Photo-optical Instrumentation Engineers
6 国際会議録 Demonstration of damage-free mask repair using electron beam-induced processes Liang, T., Stivers, A.R., Penn, M., Bald, D., Sethi, C., Boegli, V., Budach, M., Edinger, K., Spies, P. SPIE - The International Society of Optical Engineering	12 国際会議録 Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12